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2020-01-13T04:28:23-08:00
Stable Subloop Behavior in Ferroelectric Si-Doped HfO2
10.1021/acsami.9b12878
ACS Appl. Mater. Interfaces
American Chemical Society
Kyoungjun Lee
Hyun-Jae Lee
Tae Yoon Lee
Hong Heon Lim
Myeong Seop Song
Hyang Keun Yoo
Dong Ik Suh
Jae Gil Lee
Zhongwei Zhu
Alexander Yoon
Matthew R. MacDonald
Xinjian Lei
Kunwoo Park
Jungwon Park
Jun Hee Lee
Seung Chul Chae
application/pdf
research-article
http://pubs.acs.org/doi/suppl/10.1021/acsami.9b12878
© 2019 American Chemical Society
American Chemical Society
True
© 2019 American Chemical Society
© 2019 American Chemical Society
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10.1021/acsami.9b12878
VoR
10/02/2019
11
42
38929
38936
© 2019 American Chemical Society
article
1944-8244
1944-8252
ACS Applied Materials & Interfaces
research-article
Issue10.1021/acsami.9b12878VoR
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